CISSY: A station for preparation and surface/interface analysis of thin film materials and devices
DOI:
https://doi.org/10.17815/jlsrf-2-84Abstract
The CISSY end station combines thin film deposition (sputtering, molecular beam epitaxy ambient-pressure methods) with surface and bulk-sensitive analysis (photo emission, x-ray emission, x-ray absorption) in the same UHV system, allowing fast and contamination–free transfer between deposition and analysis. It is mainly used for the fabrication and characterization of thin film devices and their components like thin film photovoltaic cells, water-splitting devices and other functional thin film materials.References
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Cite article as: Helmholtz-Zentrum Berlin für Materialien und Energie. (2016). CISSY: A station for preparation and surface/ interface analysis of thin film materials and devices. Journal of large-scale research facilities, 2, A67. http://dx.doi.org/10.17815/jlsrf-2-84
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